[1]娄彦良,肖文凯..ZrO2薄膜的SPEB分析[J].郑州大学学报(工学版),2001,22(02):28-29.[doi:10.3969/j.issn.1671-6833.2001.02.009]
 Lou Yanliang,Xiao Wenkai.SPEB analysis of ZrO2 films[J].Journal of Zhengzhou University (Engineering Science),2001,22(02):28-29.[doi:10.3969/j.issn.1671-6833.2001.02.009]
点击复制

ZrO2薄膜的SPEB分析()
分享到:

《郑州大学学报(工学版)》[ISSN:1671-6833/CN:41-1339/T]

卷:
22
期数:
2001年02期
页码:
28-29
栏目:
出版日期:
1900-01-01

文章信息/Info

Title:
SPEB analysis of ZrO2 films
作者:
娄彦良肖文凯.
华中科技大学材料科学与工程学院,, 武汉大学机械工程系,
Author(s):
Lou Yanliang; Xiao Wenkai
关键词:
氧化锆薄膜 慢正电子束 成分
Keywords:
DOI:
10.3969/j.issn.1671-6833.2001.02.009
文献标志码:
A
摘要:
用慢正电子束(SPEB)对自制ZrO2薄膜进行了成分分析.结果发现,ZrO2薄膜表层存在一个厚约20 nm的高正电子吸收层,该表层的特殊结构与Y在表层的偏聚有关.高于500 ℃的退火处理可以大大减小该层的厚度.
Abstract:
Compositional analysis of homemade ZrO2 films was performed by slow positron beam (SPEB). The results show that there is a high positron absorbing layer about 2 nm thick on the surface layer of ZrO20 film, and the special structure of the surface layer is related to the partial polymerization of Y on the surface layer. Annealing treatment above 500 °C can greatly reduce the thickness of this layer.

更新日期/Last Update: 1900-01-01