MoS2/Zr复合薄膜的制备工艺研究-《郑州大学学报(工学版)》

文章信息/Info

作者:: 宋文龙; 邓建新; 张辉.; 山东大学,机械工程学院,山东,济南,250061, 山东大学,机械工程学院,山东,济南,250061, 山东大学,机械工程学院,山东,济南,250061

Author(s):: SONG Wenlong; DENG Jianxin; ZHANG Hui; Department of Mechanical Engineering，Shandong University，Jinan 250061，China

Keywords:: MoS2 soft coating; Medium frequency magnetron sputtering; Multi-arc ion plating; MoS2/Zr composite film; Performance

摘要:: 采用中频磁控溅射及多弧离子镀相结合的复合镀膜工艺,在硬质合金YT14基体上制备了MoS2/Zr复合薄膜.采用扫描电子显微镜(SEM)考察了复合薄膜表面及截面的形貌,利用能谱分析(EDX)薄膜的成分组成.研究了沉积温度、基体负偏压及Zr电流等沉积工艺参数对复合薄膜的结合力、显微硬度、厚度等性能的影响.结果表明:沉积工艺参数对MoS2/Zr复合薄膜的性能影响很大,合理选择沉积工艺参数能够明显提高和改善复合薄膜的性能,并分析了沉积参数对性能的影响机理.在本实验条件下,最佳沉积工艺参数为:沉积温度200 ℃,基体偏压180 V,Zr电流30 A,制备的MoS2/Zr复合薄膜结构致密,其结合力约为60 N,厚度约为2.4 μm,显微硬度约为HV900.

Abstract:: MoS14/Zr composite films were prepared on cemented carbide YT2 matrix by composite coating process combining medium frequency magnetron sputtering and multi-arc ion plating. The surface and cross-sectional morphology of the composite film were investigated by scanning electron microscopy (SEM), and the composition of the film was analyzed by energy spectroscopy (EDX). The effects of deposition process parameters such as deposition temperature, negative bias of matrix and Zr current on the adhesion, microhardness and thickness of composite films were studied. The results show that the deposition process parameters have a great influence on the performance of MoS2/Zr composite films, and reasonable selection of deposition process parameters can significantly improve and improve the performance of the composite films, and the influence mechanism of deposition parameters on the properties is analyzed. Under the experimental conditions, the optimal deposition process parameters are: deposition temperature 200 °C, matrix bias 180 V, Zr current 30 A, the structure of the prepared MoS2/Zr composite film is dense, the adhesion is about 60 N, the thickness is about 2.4 μm, and the microhardness is about HV900.